Stanowski, R.W, “Nano-ingéniérie de bande interdite des semiconducteurs quantiques par recuit thermique rapide au laser“, PhD in Electrical Engineering, 2011, Université de Sherbrooke, Sherbrooke, Canada. [pdf]
In the frame of this thesis, I have investigated IR laser-induced QWI processes in QW wafers comprising GaAs/AlGaAs and InP/InGaAsP microstructures and in InAs QD microstructures grown on InP substrates. For that purpose, I have designed and set up a 2-laser system for selective area rapid thermal annealing (Laser-RTA) of semiconductor wafers. The advantage of such an approach is that it allows carrying out annealing with heating-cooling rates unattainable with conventional RTA techniques, while a tightly focused beam of one of the IR lasers is used for „spot annealing‟. These features have enabled me to introduce a new method for iterative bandgap engineering at selected areas (IBESA) of semiconductor wafers. The method proves the ability to deliver both GaAs and InP based QW/QD wafers with regions of different bandgap energy controlled to better than ± 1nm of the spectral emission wavelength. The IBESA technique could be used for tuning the optical characteristics of particular regions of a QW wafer prepared for the fabrication of a PIC. Also, this approach has the potential for tuning the emission wavelength of individual QDs in wafers designed, e.g., for the fabrication of single photon emitters.